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Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputtering

Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputtering

Name: Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputtering
Brand: avramcheva.com
SKU: 19501682258
Price: 574.00 USD
Availability: InStock
Rating: 4.4482 (18 reviews)

SKU: 19501682258

4.4

USD574.00 USD612.00

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Ships within 48 hours · Estimated delivery Aug 19 - Aug 24

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Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% Oxide Magnetic film sputteringZinc Oxide Sputtering Target 99. 999% purity 4 in dia x0. 25" thickTarget bonded to Cu OFHC backing plateBacking plate 4" dia x 0. 1" thickMAK4 configuration with keeper and vented screw Piezoelectric material, Hole transport layer for solar cell

Store: avramcheva.com · Domain: avramcheva.com

Description

Magnetic film sputtering

3- 6 mm size granules

Evaporation materials- High purity Tin shot for electron beam or thermal Evaporation 99

low cost standard round Iron Sputter Targets

Exchange/Return Notes